000 00408nam a22001457a 4500
008 250512b |||||||| |||| 00| 0 eng d
020 _a9781437478595
050 _aTJ1280
_b.A38
100 _aToshiro K. Doi
245 _aAdvances in cmp Polishing Technologies
260 _aUnited Kingdom
_bWilliams Andrew Publication
_c2012
300 _axii, 317P.
_bill.
650 _aElectrolytic Polishing
942 _cBK
999 _c3397
_d3397